OAI 掩膜光刻機 Model 6000型的特點和優點
•高吞吐量（180 wph，第 ***掩模模式)和生產和研發的運行成本
•ABO光學與光均質器，以實現所需各種電阻的分辨率和曝光
•用于大深度Foucs的特殊光學
•靈活處理基板從2“平方到12”平方
•可手動或自動上料
配置。
•系統配置頂部和/或底部側面/ IR 自動對準Vision ProR軟件
•適用于各種基材尺寸和類型
•基于Windows的軟件
•菜單驅動的GUI與工藝配方存儲
•全場曝光，提高吞吐量
•頂部加載口罩支架，方便，快速，安全的口罩更換
•可選全球調平零接觸處理
•雙臂4軸機器人搬運系統(可選)
•自調平工裝隔振
•卓越的服務支持(約95%的服務水平)
Mask Aligner - Model 6000 Features ａnd Benefits
• High throughput (180 wph, first mask mode) and Lowest Cost of operation for production ａnd R&D
• ABO Optics with light homogenizer to achieve required resolutions & exposures for various resists
• Special Optics for Large Depth of Foucs
• Flexibility with substrate handling from 2”sq to 12”sq
• Comes in manual loading or automated loading configurations.
• System configuration with top and/or bottom side / IR auto alignment with Cognex Vision ProR Software
• Adaptable to various substrate sizes ａnd types
• Windows based software
• Menu driven GUI with process recipe storage
• Full field exposure for higher throughput
• Top load mask holder for easy, fast ａnd safe mask replacements
• Optional Global leveling for zero contact processing
• Dual arm 4-axis robot handling system (optional)
• Self leveling tooling vibration isolation
• Superior service support (~95% service level)
滬公網安備31011502016460號
